FSI’s proprietary STG rinse/dry technology helps eliminate water spots that can be left by conventional rinse/dry equipment.
The growing customer base for STG technology find that our rinse/dry capability enhances the performance of traditional wet benches, said John Ely, president of FSI’s Surface Conditioning Division. We are pleased to have a partner of KDNS’ reputation using this technology for its 200 and 300 mm state-of-the-art cleaning requirements. It is FSI’s intent to offer its worldwide customer base a total cleaning solution. We fulfill this broad strategy through our own products and OEM product enhancements to provide the customers with solutions that best suit their specific needs.
We feel with FSI we are partnering with a technology leader in cleaning, said Dr. Chang-Hyun Park, KDNS CEO and president. We also acknowledge the confidence FSI has placed in KDNS to support their customers in Korea and this mutual collaboration will bring us a high level of synergy in the future.
FSI’s patented Surface Tension Gradient (STG) drying technology effectively prevents the formation of watermarks and stains on dried wafers, after any wet process. An environmentally friendly technology, it uses minimal chemicals (less than two milliliters isopropyl alcohol per run) and provides a rinse/dry process that is particle-neutral and watermark-free. The OEM immersion rinse dry units can be used on a variety of substrates, including wafers, disks and flat panels.
